Abstract
Based on a moving mask deep X-ray lithography concept, a new deep X-ray exposure system with multi stage has been built up, which can fabricate 3 dimensional microstructures with controllable free shaped wall such as inclined, curved and vertical wall. The system has 6 stages, an X-stage and a Y-stage for substrate scanning, a substrate tilt stage and a substrate rotation stage for controlling an incident X-ray angle to a substrate, an X–Y stage for mask movement and X–Y stage for substrate and mask alignment. The system performance has been confirmed by fabricating microstructures such as gratings, micro grid and micro prism.
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Received: 10 August 2001/Accepted: 24 September 2001
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Tabata, O., You, H., Matsuzuka, N. et al. Moving mask deep X-ray lithography system with multi stage for 3-D microfabrication. Microsystem Technologies 8, 93–98 (2002). https://doi.org/10.1007/s00542-001-0168-0
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DOI: https://doi.org/10.1007/s00542-001-0168-0