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Micelle formation induced by photo-Claisen rearrangement of poly(4-allyloxystyrene)-block-polystyrene

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Abstract

A novel micelle formation induced by the photo-Claisen rearrangement was attained using a poly(4-allyloxystyrene)-block-polystyrene (PASt-b-PSt) diblock copolymer. The photoreaction was performed in cyclohexane at room temperature without a catalyst. The conversion of the 4-allyloxystyrene units reached 90% by irradiation for 24 h. The photo-Claisen rearrangement of PASt-b-PSt into poly(3-allyl-4-hydroxystyrene)-block-PSt quantitatively proceeded up to a 20% conversion; however, the elimination of the allyl groups competitively occurred over the 20% conversion. The degrees of the photorearrangement and elimination showed good agreement in their material balance throughout the course of the reaction. Both of the photorearrangement and elimination finally reached ca. 50% degrees over 60% conversion. The light-scattering studies demonstrated that the PASt-b-PSt copolymer with a 36-nm hydrodynamic diameter as unimers formed micelles with a 98-nm diameter by irradiation.

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Authors and Affiliations

  1. Department of Materials Science, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi, 441-8580, Japan

    Eri Yoshida & Satoshi Kuwayama

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  1. Eri Yoshida
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  2. Satoshi Kuwayama
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Correspondence to Eri Yoshida.

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Yoshida, E., Kuwayama, S. Micelle formation induced by photo-Claisen rearrangement of poly(4-allyloxystyrene)-block-polystyrene. Colloid Polym Sci 287, 789–793 (2009). https://doi.org/10.1007/s00396-009-2029-9

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  • DOI: https://doi.org/10.1007/s00396-009-2029-9

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