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Nanoscale atomic lithography with a cesium atomic beam

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2

 line (852 nm) and a width of about 120 nm and covering a large area of approximately 1 mm2.

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Authors and Affiliations

  1. Institut für Angewandte Physik, Universität Bonn, Wegelerstr. 8, D-53115 Bonn, Germany (Fax: +49-228/733474, E-mail: sek@iap.uni-bonn.de), , , , , , DE

    F. Lison, H.-J. Adams, D. Haubrich, M. Kreis & D. Meschede

  2. Fakultät für Physik, Universität Konstanz, Universitätsstr. 10, D-78457 Konstanz, Germany, , , , , , DE

    S. Nowak

Authors
  1. F. Lison
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  2. H.-J. Adams
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  3. D. Haubrich
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  4. M. Kreis
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  5. S. Nowak
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  6. D. Meschede
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Received: 3 July 1997/Accepted: 7 July 1997

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Lison, F., Adams, HJ., Haubrich, D. et al. Nanoscale atomic lithography with a cesium atomic beam. Appl Phys B 65, 419–421 (1997). https://doi.org/10.1007/s003400050290

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  • DOI: https://doi.org/10.1007/s003400050290

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