Abstract.
We characterize the spectral properties of X-rays generated from selected metal and semiconductor targets when 120-fs laser pulses are focused to intensities of∼1014–3×1015 W/cm2 during laser micromachining in air. High fluxes of multi-keV-energy X-rays could be obtained with 280-μJ pulses at a 1 kHz repetition rate. The yield and spectral composition of the X-rays are found to depend sensitively on the processing conditions, and thus the X-ray emission is expected to be a novel indicator of optimal laser machining.
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Received: 17 July 2000 / Accepted: 27 October 2000 / Published online: 28 February 2001
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Thogersen, J., Borowiec, A., Haugen, H. et al. X-ray emission from femtosecond laser micromachining . Appl Phys A 73, 361–363 (2001). https://doi.org/10.1007/s003390100741
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DOI: https://doi.org/10.1007/s003390100741