Abstract.
Titanium-containing amorphous hydrogenated silicon–carbon films (aSi1-xCx:H/Ti) have been deposited by reactive magnetron cosputtering. Core-level photoelectron spectroscopy (XPS) and valence-band photoelectron spectroscopy (UPS) have served as means for the characterization of these films. The spectroscopic data are interpreted by a structural model on the basis of a nanocomposite containing clusters of a Ti-C-Si alloy being embedded in an amorphous hydrogenated silicon–carbon matrix (aSi1-xCx:H). The Ti-C-Si compound is of metallic character and most likely a substitutional solid solution. This novel nanocomposite material is a promising candidate for applications, especially as optical selective absorber coating for solar collectors.
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Received: 10 July 2000 / Accepted: 15 September 2000 / Published online: 21 March 2001
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Schüler, A., Oelhafen, P. Photoelectron spectroscopic characterization of titanium-containing amorphous hydrogenated silicon–carbon films (aSi1-xCx:H/Ti) . Appl Phys A 73, 237–245 (2001). https://doi.org/10.1007/s003390100720
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DOI: https://doi.org/10.1007/s003390100720