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Thermodynamics of diamond film deposition at low pressure from chlorinated precursors

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and C2H2 concentrations at growth surface and accelerating abstraction of surface-terminating atoms. The effects of Cl addition on diamond film quality are also discussed.

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Authors and Affiliations

  1. CVD Lab., Department of Electronic Engineering, Fudan University, Shanghai 200433, P.R. China, , , , , , CN

    Z.-J. Liu, D.W. Zhang, Y.-Z. Wan, J.-Y. Zhang & J.-T. Wang

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  1. Z.-J. Liu
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  2. D.W. Zhang
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  3. Y.-Z. Wan
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  4. J.-Y. Zhang
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  5. J.-T. Wang
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Received: 1 May 1998 / Accepted: 15 October 1998

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Liu, ZJ., Zhang, D., Wan, YZ. et al. Thermodynamics of diamond film deposition at low pressure from chlorinated precursors . Appl Phys A 68, 359–362 (1999). https://doi.org/10.1007/s003390050904

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  • DOI: https://doi.org/10.1007/s003390050904

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