Abstract
At moderately elevated temperatures, radiation defects in SiC exhibit pronounced dynamic annealing, which remains poorly understood. Here, we study 3C-SiC bombarded at 100 \(^{\circ }\)C with pulsed beams of 500 keV Ar ions. Radiation damage is monitored by a combination of X-ray diffraction, Raman scattering, and ion channeling. Similar damage buildup behavior but with different defect relaxation time constants, ranging from \(\sim 1\) to \(\sim 6\) ms, is observed for the different types of lattice defects probed by these techniques. A correlation between relaxation times and the nature of the defects is proposed. These results reveal additional complexity of radiation defect dynamics in SiC and demonstrate that results of different defect characterization techniques are needed for a better understanding of dynamic annealing processes in solids.
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Acknowledgements
Work at LLNL was performed under the auspices of the U.S. DOE by LLNL under Contract DE-AC52-07NA27344. J.B.W acknowledges the LGSP for funding.
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Bayu Aji, L.B., Stavrou, E., Wallace, J.B. et al. Comparative study of radiation defect dynamics in 3C-SiC by X-ray diffraction, Raman scattering, and ion channeling. Appl. Phys. A 125, 28 (2019). https://doi.org/10.1007/s00339-018-2325-7
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DOI: https://doi.org/10.1007/s00339-018-2325-7