Skip to main content
Log in

Effect of different constant compliance current for hopping conduction distance properties of the Sn:SiOx thin film RRAM devices

  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

To effectively lower the power consumption effect of Sn:SiO2 RRAM devices, the electrical hopping conduction mechanism for set/reset state was effectively used and achieved by different constant compliance current forming process. To assume and discuss the tin metal clustered reaction and electron transport behaviors in metallic filament path-forming model, the various electrical switching current and conduction mechanism model of the Sn:SiO2 RRAM devices for different constant compliance current were also investigated and described. Finally, the switching current relationship between hopping conduction energy and average inter-trap distance properties of the RRAM devices was also simulated and demonstrated in this study.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8

Similar content being viewed by others

References

  1. C.T. Tsai, T.C. Chang, P.T. Liu, P.Y. Yang, Y.C. Kuo, K.T. Kin, P.L. Chang, F.S. Huang, Appl. Phys. Lett. 91(1), 012109 (2007)

    Article  ADS  Google Scholar 

  2. C.T. Tsai, T.C. Chang, K.T. Kin, P.T. Liu, P.Y. Yang, C.F. Weng, F.S. Huang, J. Appl. Phys. 103(7), 074108 (2008)

    Article  ADS  Google Scholar 

  3. M.C. Chen, T.C. Chang, S.Y. Huang, K.C. Chang, H.W. Li, S.C. Chen, J. Lu, Y. Shi, Appl. Phys. Lett. 94, 162111 (2009)

    Article  ADS  Google Scholar 

  4. K.H. Chen, T.C. Chang, G.C. Chang, Y.E. Hsu, Y.C. Chen, H.Q. Xu, Appl. Phys. A Mater. Sci. Process. 99(1), 291 (2010)

    Article  ADS  Google Scholar 

  5. P.C. Yang, T.C. Chang, S.C. Chen, Y.S. Lin, H.C. Huang, D.S. Gan, Electrochem. Solid State Lett. 14(2), H93 (2011)

    Article  Google Scholar 

  6. Y.E. Syu, T.C. Chang, T.M. Tsai, Y.C. Hung, K.C. Chang, M.J. Tsai, M.J. Kao, S.M. Sze, IEEE Electron Device Lett. 32(4), 545 (2011)

    Article  ADS  Google Scholar 

  7. L.W. Feng, C.Y. Chang, Y.F. Chang, W.R. Chen, S.Y. Wang, P.W. Chiang, T.C. Chang, Appl. Phys. Lett. 96, 052111 (2010)

    Article  ADS  Google Scholar 

  8. L.W. Feng, C.Y. Chang, Y.F. Chang, T.C. Chang, S.Y. Wang, S.C. Chen, C.C. Lin, S.C. Chen, P.W. Chiang, Appl. Phys. Lett. 96, 222108 (2010)

    Article  ADS  Google Scholar 

  9. K.H. Chen, Y.C. Chen, C.F. Yang, T.C. Chang, J. Phys. Chem. Solids 69, 461 (2008)

    Article  ADS  Google Scholar 

  10. C.F. Yang, K.H. Chen, Y.C. Chen, T.C. Chang, Ultrasonic, ferroelectrics and frequency control. IEEE Trans. 54, 1726 (2007)

    Google Scholar 

  11. C.F. Yang, K.H. Chen, Y.C. Chen, T.C. Chang, Appl. Phys. A 90, 329 (2008)

    Article  ADS  Google Scholar 

  12. K.H. Chen, Y.C. Chen, Z.S. Chen, C.F. Yang, T.C. Chang, Appl. Phys. A 89, 533 (2007)

    Article  ADS  Google Scholar 

  13. K.H. Chen, C.H. Chang, C.M. Cheng, C.F. Yang, Appl. Phys. A 97, 919 (2009)

    Article  ADS  Google Scholar 

  14. K.H. Chen, C.M. Cheng, C.C. Shih, J.H. Tsai, Appl. Phys. A 103, 1173 (2011)

    Article  ADS  Google Scholar 

  15. C.M. Cheng, K.H. Chen, J.H. Tsai, C.L. Wu, Ceram. Int. 38, S87 (2012)

    Article  Google Scholar 

  16. X. Cao, X.M. Li, X.D. Gao, Y.W. Zhang, X.J. Liu, Q. Wang, L.D. Chen, Appl. Phys. A 97, 883 (2009)

    Article  ADS  Google Scholar 

  17. H.J. Wan, P. Zhou, L. Ye, Y.Y. Lin, T.A. Tang, H.M. Wu, M.H. Chi, IEEE Electron Device Lett. 31(3), 246 (2010)

    Article  ADS  Google Scholar 

  18. T.M. Tsai, K.C. Chang, T.C. Chang, G.W. Chang, Y.E. Syu, Y.T. Su, G.R. Liu, K.H. Liao, M.C. Chen, H.C. Huang, Y.H. Tai, D.S. Gan, C. Ye, H. Wang, S.M. Sze, IEEE Electron Device Lett. 33(12), 1693 (2012)

    Article  ADS  Google Scholar 

  19. T.Y. Tseng, H. Nalwa, Hand Book of Nanoceramics and Their Nased Nano Devices (American Scientific Publishers, USA, 2009), p. 175

    Google Scholar 

  20. T. Yamada, H. Yabutani, T. Saito, C.Y. Yang, Nanotechnology 21(26), 265707 (2010)

    Article  ADS  Google Scholar 

  21. K.H. Chen, K.C. Chang, T.C. Chang, T.M. Tsai, K.H. Liao, Y.E. Syu, S.M. Sze, Appl. Phys. A 119, 1609 (2015)

    Article  ADS  Google Scholar 

Download references

Acknowledgments

This work will acknowledge the financial support of the National Science Council of the Republic of China (103-2633-E-272-001-) and (104-2633-E-272 -001 -MY2).

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Kai-Huang Chen.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Chen, KH., Chang, KC., Chang, TC. et al. Effect of different constant compliance current for hopping conduction distance properties of the Sn:SiOx thin film RRAM devices. Appl. Phys. A 122, 228 (2016). https://doi.org/10.1007/s00339-016-9768-5

Download citation

  • Received:

  • Accepted:

  • Published:

  • DOI: https://doi.org/10.1007/s00339-016-9768-5

Keywords

Navigation