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Numerical and experimental study of nanolithography using nanoscale C-shaped aperture

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Abstract

Nanoscale ridge apertures have been demonstrated to be used for high-resolution lithography. To improve the performance of nanolithography, it is necessary to study the characteristics of near-field distribution. In this paper, we perform numerical and experimental study of C-shaped nanoscale ridge aperture to analyze its detailed field distribution for contact lithography. It is found that the high imaging contrast, which is necessary for good quality lithography, is achieved within the optical near field and decays quickly with the increasing distance. We compare the C-shaped nanoscale aperture with regular shape apertures to show its advantages for producing high-transmission field intensity with high imaging contrast. It is also found that C-shaped nanoscale aperture with a smaller ridge and embedded in aluminum film can obtain better lithography result due to its enhanced transmission and high imaging contrast.

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Acknowledgments

The financial support to this work by the 1000 young talents program of China is acknowledged. Fabrications of aperture samples are carried out at the Nanotechnology Center of University of Science and Technology of China.

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Authors and Affiliations

  1. Department of Optics and Optical Engineering, University of Science and Technology of China, Hefei, 230026, Anhui, China

    Li Ding & Liang Wang

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  1. Li Ding
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  2. Liang Wang
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Correspondence to Liang Wang.

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Ding, L., Wang, L. Numerical and experimental study of nanolithography using nanoscale C-shaped aperture. Appl. Phys. A 119, 1133–1141 (2015). https://doi.org/10.1007/s00339-015-9080-9

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  • DOI: https://doi.org/10.1007/s00339-015-9080-9

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