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Impact of annealing atmosphere on the multiferroic and dielectric properties of BiFeO3/Bi3.25La0.75Ti3O12 thin films

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Abstract

Multiferroic BiFeO3/Bi3.25La0.75Ti3O12 films annealed in different atmospheres (N2 or O2) were prepared on Pt/Ti/SiO2/Si substrates via a metal organic decomposition method. Based on our experimental results, it is considered that, in the films annealed in N2, fewer Fe2+ ions while more oxygen vacancies are involved. As a result, at room temperature, predominated by the reduced Fe2+ fraction, lower leakage current and dielectric loss, better ferroelectric property while reduced magnetization are observed. However, the oxygen vacancies might be thermally activated at elevated temperature; thus, more strongly temperature-dependent leakage current and a higher dielectric relaxation peak are observed for the films annealed in N2.

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Authors and Affiliations

  1. National Laboratory of Solid State Microstructures, Physics Department, Nanjing University, Nanjing, 210093, People’s Republic of China

    Fengzhen Huang, Xiaomei Lu, Zhe Wang, Weiwei Lin, Yi Kan, Huifeng Bo, Wei Cai & Jinsong Zhu

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  1. Fengzhen Huang
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  2. Xiaomei Lu
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  3. Zhe Wang
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  4. Weiwei Lin
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  7. Wei Cai
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  8. Jinsong Zhu
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Correspondence to Xiaomei Lu.

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Huang, F., Lu, X., Wang, Z. et al. Impact of annealing atmosphere on the multiferroic and dielectric properties of BiFeO3/Bi3.25La0.75Ti3O12 thin films. Appl. Phys. A 97, 699–704 (2009). https://doi.org/10.1007/s00339-009-5297-9

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  • DOI: https://doi.org/10.1007/s00339-009-5297-9

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