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Control of electrical resistance of TiO2 films by short-pulse laser irradiation

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Abstract

Titanium dioxide (TiO2) films were irradiated with a femtosecond laser beam to alter their electrical resistances. The TiO2 film was produced by aerosol beam deposition. The wavelength, pulse duration, and repetition rate of the femtosecond laser scanned across the sample surface were 800 nm, 100 fs, and 1 kHz, respectively. By attenuating the laser fluence on the TiO2 film, a range was found in which the electrical resistance of the TiO2 film was varied even though the morphology of the film surface was not changed.

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Authors and Affiliations

  1. Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan

    M. Tsukamoto & N. Abe

  2. Graduate school of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, 565-0871, Japan

    Y. Soga

  3. School of Science and Engineering, Kinki University, Higasi-Osaka, Osaka, 577-8502, Japan

    M. Yoshida & H. Nakano

  4. Institute for Laser Technology, 2-6 Yamadaoka, Suita, Osaka, 565-0871, Japan

    M. Fujita

  5. National Institute of Advanced Industrial Science and Technology, 1-2 Namiki, Tsukuba, Ibaraki, 305-8564, Japan

    J. Akedo

Authors
  1. M. Tsukamoto
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  2. N. Abe
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  3. Y. Soga
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  4. M. Yoshida
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  5. H. Nakano
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  6. M. Fujita
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  7. J. Akedo
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Correspondence to M. Tsukamoto.

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Tsukamoto, M., Abe, N., Soga, Y. et al. Control of electrical resistance of TiO2 films by short-pulse laser irradiation. Appl. Phys. A 93, 193–196 (2008). https://doi.org/10.1007/s00339-008-4713-x

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  • DOI: https://doi.org/10.1007/s00339-008-4713-x

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