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Low-resistivity indium tantalum oxide films by magnetron sputtering

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Abstract

Low-resistivity Ta-doped In2O3 (InTaO) films from ceramic targets of In2O3 doped with 2, 5, and 10 wt % Ta2O5 were deposited on Corning glass # 1737 substrates by magnetron sputtering. The electrical and optical properties of these films were studied. The carrier type of InTaO films was found to be n-type. The resistivity, carrier density, and Hall mobility of InTaO films were in the range of 0.28–200.2×10-4 Ω cm, 0.2–7.4×1020 cm-3, and 3–31 cm2 V-1 s-1, respectively. A minimum resistivity of 2.8×10-4 Ω cm with a mobility of 31 cm2 V-1 s-1 and a high transparency of 85% in the visible were achieved for the InTaO thin films doped with 5 wt % Ta2O5.

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References

  1. R.G. Gordon: MRS Bull. 25, 52 (2000)

    Article  Google Scholar 

  2. B.G. Lewis, D.C. Paine: MRS Bull. 25, 22 (2000)

    Article  Google Scholar 

  3. D.S. Ginley, C. Bright: MRS Bull. 25, 15 (2000)

    Article  Google Scholar 

  4. H. Izumi, F.O. Adurodija, T. Kaneyoshi, T. Ishihara, H. Yoshioka, M. Motoyama: J. Appl. Phys. 91, 1213 (2002)

    Article  ADS  Google Scholar 

  5. L.J. van der Pauw: Philips Tech. Rundsch. 20, 230 (1958)

    Google Scholar 

  6. H. Kim, C.M. Gilmore, A. Pique, J.S. Horwitz, H. Mattoussi, H. Murata, Z.H. Kafafi, D.B. Chrisey: J. Appl. Phys. 86, 6451 (1999)

    Article  ADS  Google Scholar 

  7. T. Minami: MRS Bull. 25, 38 (2000)

    Article  Google Scholar 

  8. R.J. Cava, J.M. Phillips, J. Kwo, G.A. Thomas, R.B. van Dover, S.A. Carter, J.J. Krajewski, W.F. Peck, Jr., J.H. Marshall, D.H. Rapkine: Appl. Phys. Lett. 64, 2071 (1994)

    Article  ADS  Google Scholar 

  9. G.S. Chae: Jpn. J. Appl. Phys. 40, 1281 (2001)

    Article  ADS  Google Scholar 

  10. S.B. Qadri, H. Kim, H.R. Khan, A. Pique, J.S. Horwitz, D. Chrisey, W.J. Kim, E.F. Skelton: Thin Solid Films 377, 750 (2000)

    Article  ADS  Google Scholar 

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Correspondence to H. Ju.

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81.15.Cd; 81.40.Rs; 73.90.+f

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Ju, H., Hwang, S., Jeong, CO. et al. Low-resistivity indium tantalum oxide films by magnetron sputtering. Appl. Phys. A 79, 109–111 (2004). https://doi.org/10.1007/s00339-004-2593-2

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  • DOI: https://doi.org/10.1007/s00339-004-2593-2

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