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Lithographic results of electron beam photoresists prepared by living free radical polymerization

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Summary

A new family of random copolymers composed of chloromethylstyrene and a silicon based styrenic monomer was prepared using living radical polymerization. The lithographic efficiency of the resulting electron beam resists was examined. A pronounced improvement on the lithographic resolution and image quality of resists with a narrow molecular mass distribution was observed and is described.

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Authors and Affiliations

  1. Cornell University, Materials Science and Engineering, Ithaca, NY 14853-1501, USA, , , , , , US

    M. Chiara Bignozzi & Christopher K. Ober

  2. Lucent Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974, USA, , , , , , US

    Anthony J. Novembre & Chester Knurek

Authors
  1. M. Chiara Bignozzi
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  2. Christopher K. Ober
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  3. Anthony J. Novembre
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  4. Chester Knurek
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Additional information

Received: 20 April 1999/Revised version: 11 June 1999/Accepted: 17 June 1999

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Bignozzi, M., Ober, C., Novembre, A. et al. Lithographic results of electron beam photoresists prepared by living free radical polymerization. Polymer Bulletin 43, 93–100 (1999). https://doi.org/10.1007/s002890050538

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  • DOI: https://doi.org/10.1007/s002890050538

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