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Screening for candidate genes involved in tolerance to organic solvents in yeast

  • Genomics and Proteomics
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Abstract

Saccharomyces cerevisiae mutant strain, KK-211, isolated from serial culture in medium containing isooctane showed an extremely higher tolerance to the hydrophobic organic-solvents, which are toxic to yeast cells compared to the wild-type parent strain, DY-1. To detect genes that are related to this tolerance, a DNA microarray analysis was performed using mRNAs isolated from strains DY-1 and KK-211. Fourteen genes were identified as being related to the tolerance. The expression of 12 genes including ICT1, YNL190W, and PRY3, was induced while the expression of two genes including PHO84 was repressed in strain KK-211. Two genes, ICT1 and YNL190W showed the same profile in the DNA microarray analysis and a differential display-polymerase chain reaction analysis. But, there is no detectable difference in the expression profile of KK-211 cells cultured with or without isooctane. The results suggest that change in expression levels of multiple genes that confer the modification function of the cell surface, not by a single gene, might be required for yeast cell tolerance to organic solvents.

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Authors and Affiliations

  1. Division of Applied Life Sciences, Graduate School of Agriculture, Kyoto University, Sakyo-ku, Kyoto, 606-8502, Japan

    Ken Matsui, Takashi Hirayama, Kouichi Kuroda & Mitsuyoshi Ueda

  2. Gene Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 226-8501, Japan

    Katsuhiko Shirahige

  3. Institute for Advanced Technology, Suntory Ltd, Osaka, 618-8503, Japan

    Toshihiko Ashikari

Authors
  1. Ken Matsui
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  2. Takashi Hirayama
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  3. Kouichi Kuroda
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  4. Katsuhiko Shirahige
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  5. Toshihiko Ashikari
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  6. Mitsuyoshi Ueda
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Correspondence to Mitsuyoshi Ueda.

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Matsui, K., Hirayama, T., Kuroda, K. et al. Screening for candidate genes involved in tolerance to organic solvents in yeast. Appl Microbiol Biotechnol 71, 75–79 (2006). https://doi.org/10.1007/s00253-006-0328-3

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  • DOI: https://doi.org/10.1007/s00253-006-0328-3

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