Abstract
The measured peak shape and intensity of the photoemitted signal in X-ray photoelectron spectroscopy (XPS) experiments (elastic and inelastic parts included) are strongly correlated, through electron-transport theory, with the depth distribution of photoelectron emitters within the analyzed surface. This is the basis of so-called XPS peak-shape analysis (also known as the Tougaard method) for non-destructive determination of compositional in-depth (up to 6–8 nm) profiles. This review describes the theoretical basis and reliability of this procedure for quantifying amounts and distributions of material within a surface. The possibilities of this kind of analysis are illustrated with several case examples related to the study of the initial steps of thin-film growth and the modifications induced in polymer surfaces after plasma treatments.
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Acknowledgements
We thank the Ministry of Science and Education of Spain (projects MAT2007-65764 and Consolider Funcoat CSD2008-00023) and the Junta de Andalucía (projects TEP2275 and P07-FQM-03298) for financial support.
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López-Santos, M.C., Yubero, F., Espinós, J.P. et al. Non-destructive depth compositional profiles by XPS peak-shape analysis. Anal Bioanal Chem 396, 2757–2768 (2010). https://doi.org/10.1007/s00216-009-3312-9
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DOI: https://doi.org/10.1007/s00216-009-3312-9