Nitrogen effects in multi-matrix calibrations by radiofrequency glow discharge – optical emission spectrometry

Abstract

A study about the effect of nitrogen in the calibration curves of a series of analytical emission lines has been carried out in this work. Fifteen reference materials with different matrices (Fe, Al, Zn, Cu and Ni) were used (three of these reference materials contain nitrogen in their composition) and plots of intensity versus the product “sputtering rate times element concentration” were constructed for emission lines of the analytes considered in this work (Al, Fe, Cu, Cr, C, Mo, Zn, Si, Ti and Ni). Two different fits were performed in each plot, first considering only the points corresponding to samples without nitrogen in their composition and secondly including all the points. The results show almost negligible differences in the emission yields calculated. On the other hand, a mixture of Ar containing 0.5% N₂ was employed to check if the nitrogen effect was present at higher concentrations than those expected in analysis when samples with high nitrogen concentrations are used. Differences between the slopes of the calibration curves with the Ar/N₂ and pure Ar discharges were obtained (up to 30%). A study of the molecular bands recorded in the spectra when nitrogen is present in the discharge and determination of the resulting interferences on the analytes have been performed.