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Modeling and simulation of material removal in planarization process

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Abstract

In planarization processes, material removal analysis is essential to the estimation of the wear rate and non-uniformity. A model that describes the material removal of a pad with rough surface grinding by using abrasive grains is developed. A collection of micro-contact spots is identified and the deformation approach is subsequently calculated. Elastic-plastic theory and the wear model are used to construct the expression for the magnitude of material removal as a function of the indentation depth. First, the indentation depth of micro-contact spots in the asperity of the pad and the deformation of the flat part of pad are obtained by using elastic-plastic theory. Then, the material removal caused by individual micro-contacts is calculated with the help of wear theory. Finally, the macroscopic wear volume is found by summing the volumetric wear of each individual micro-contact. Moreover, the pad dressing process is introduced to demonstrate the developed model for material removal. A parametric study is conducted to explore the influence on the material removal results and the planarization interfacial phenomena of operational parameters. These parameters compose of the applied down force, rotational speed of dresser, and the density of abrasive grains. The results provide a detailed picture of the interface phenomena and yield an insight into the physical effects of the operating parameters in the planarization processes.

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References

  1. Lin SC, Wu ML (2002) A study of the effects of polisfing parameters on material removal rate and non-uniformity. Int J Mach Tools Manuf 42(1):99–103

    Article  Google Scholar 

  2. Horng TL (2003) An analysis of the pad deformation for improved planarization. Key Eng Mater 238–239:241–246

    Article  Google Scholar 

  3. Horng TL (2007) Estimation of material removal with the help of pad deformation in plararization process. J Mater Process Technol 182(1–3):139–145

    Article  Google Scholar 

  4. Preston FW (1927) The theory and design of plate glass polishing machines. J Soc Glass Technol 11:214

    Google Scholar 

  5. Tseng WT, Liu CW, Dai BT, Yeh CF (1996) Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin film. Thin Solid Films 290–291:458–463

    Article  Google Scholar 

  6. Xie Y, Bhushan B (1996) Effects of particle size, polishing pad and contact pressure in free abrasive polishing. Wear 200(1–2):281–295

    Article  Google Scholar 

  7. Jeng YR, Huang PY (2005) A material removal rate model considering interfacial micro-contact wear behavior for chemical mechanical polishing. J Tribol 127(1):190–197

    Article  Google Scholar 

  8. Luo J, Dornfeld DA (2001) Material removal mechanism in chemical mechanical polishing. IEEE Trans Semicond Manuf 14(2):112–133

    Article  Google Scholar 

  9. Luo J, Dornfeld DA (2003) Effects of abrasive size distribution in chemical mechanical planarization: modeling and verification. IEEE Trans Semicond Manuf 16(3):469–476

    Article  Google Scholar 

  10. Masen MA, De Rooij MB, Schipper DJ (2005) Micro-contact based modelling of abrasive wear. Wear 258(1–4):339–348

    Article  Google Scholar 

  11. Jeng YR, Wang PY (2003) An elliptical microcontact model considering elastic, elastoplastic, and plastic deformation. J Tribol 125(2):232–240

    Article  Google Scholar 

  12. Tabor D (1951) The hardness of metals. Clarendon Press, Oxford, UK

    Google Scholar 

  13. Johnson KL (1985) Contact mechanics. Cambridge University Press, Cambridge, UK

    MATH  Google Scholar 

  14. Hamrock BJ (1983) Simplified solution for stresses and deformations. J Lubr Technol 105(2):171–177

    Article  Google Scholar 

  15. Jiang J, Arnell RD (1998) The dependence of the fraction of material removed on the degree of penetration in single particle abrasion of ductile materials. Appl Phys 31(10):1163–1167

    Google Scholar 

  16. Zum Gahr KH, Mewes D (1983) Severity of material removal in abrasive wear of ductile metals. Wear of Maters: Int. Conference on Wear of Maters: 130–139

  17. Zhou YY, Davis EC (1999) Variation of polishing pad shpae during pad dressing. Mater Sci Eng B B68(2):91–98

    Article  Google Scholar 

  18. Chen CC, Juang YS, Lin WZ (2002) Generation of fractal toolpaths for irregular shapes of surface finishing areas. J Mater Process Technol 127(2):146–150

    Article  Google Scholar 

  19. Yin TH, Chen CC, Liu WC (1997) Analysis of surface roughness of machined surfaces using fractal dimension method. Proc. Int. Conference on Precision Engineering, 18th–20th, Taipei

  20. Goryacheva IG (1998) Contact mechanics in tribology. Kluwer Academic Publishers-Dordrecht, Boston London, ISBN 0-7923-5257-2

  21. Bershadsky LI (1981) Self-organization and reliability of tribosystems. (I.R.) Znanie, Kiev

    Google Scholar 

  22. Poltser G, Ebeling W, Firkovskii A (1988) External friction of solid bodies, dissipative structures and self-organization. Sov J Frict Wear 9(1):6–11

    Google Scholar 

  23. Bushe NA (1994) Evalustion of metallic materials in tribosystem compatibity. Tribology in the USA and the Former Soviet Union: Studies and application, Allerton Press: 139–155

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Correspondence to Thin-Lin Horng.

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Horng, TL. Modeling and simulation of material removal in planarization process. Int J Adv Manuf Technol 37, 323–334 (2008). https://doi.org/10.1007/s00170-007-0978-z

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  • DOI: https://doi.org/10.1007/s00170-007-0978-z

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