Numerical Analysis of a Mask Type Stereolithography Process Using a Dynamic Finite-Element Method

Abstract

In many investigations, a liquid crystal display (LCD) has been used as the photo mask in a stereolithography system. The LCD mask has the potential to increase the speed of rapid prototyping (RP) fabrication as well as to reduce the system cost. Compared to the conventional laser-scanning technique used in 3D systems stereolithography apparatus (SLA), the reaction heat of layer curing is released as the area is exposed, and it is higher than that of the laser scanning in which the reaction heat only releases point-by-point. On the other hand, mask type stereolithography has a more serious shrinkage effect than the other methods and requires further analysis. This paper analyses the shrinkage deformation of the mask type stereolithography process. A simulation code based on the dynamic finite-element method has been developed to predict the 3D shrinkage and to monitor the RP fabrication, which consists of three stages of simulation which include the pre-processor, the analytic processor and the post-processor. In order to fabricate experimental parts, a mask type stereolithography system has been assembled. The principle of the experimental apparatus is also briefly described. For evaluation of the experimental and simulation results, a thin shell wall rectangular part was fabricated and measured. The simulation program developed has been proved to be in good agreement with the experimental results.