Abstract
Impedance measurements were performed on aluminium in 0.5M NaCl in the frequency range 5×10−4-104 Hz and before the onset of pitting corrosion. The behaviour of the system was characterized by a high frequency capacitive loop related to the thickness of the oxide film, an inductive loop at medium frequency, which was interpreted on the basis of the dielectric relaxation model proposed by Dignam, and a second capacitive loop obtained at low frequencies which was ascribed to the film dissolution through the formation of a soluble chloride containing aluminium salt.
Similar content being viewed by others
References
L. Young, ‘Anodic Oxide Films’, Academic Press, New York (1961).
V. Brusic, in ‘Oxides and Oxide Films’ Vol. 1 (edited by J. W. Diggle), Marcel Dekker, New York (1973) ch. 1.
M. J. Dignam, ch. 2.
H. H. Uhilg,Corros. Sci. 19 (1979) 777.
I. Epelboin, C. Gabrielli, M. Keddam and H. Takenouti, in ‘Comprehensive Treatise of Electrochemistry’ Vol. 4 (edited by J. O'M. Bockris et al.), Plenum Press, New York (1981) ch. 3.
N. Sato and G. Okamoto, ch. 4.
M. J. Dignam, ch. 5.
D. F. Taylor and M. J. Dignam,J. Electrochem. Soc. 120 (1973) 1299, 1306.
R. D. Armstrong and K. Edmondson,Electrochim. Acta 18 (1973) 937.
H. J. de Wit, C. Wijenberg and C. Crevecoeur,J. Electrochem. Soc. 126 (1979) 779.
C. Y. Chao, L. F. Lin and D. D. Macdonald,129 (1982) 1874.
S. Ikonopisov, L. Andreeva and C. Vodenicharov,Electrochim. Acta 15 (1970) 421.
J. Bessone, C. Mayer, K. Jüttner and W. J. Lorenz,28 (1983) 171.
M. Keddam, J. F. Lizee, C. Pallota and H. Takenonti,J. Electrochem. Soc. 131 (1984) 2016.
Z. A. Foroulis and M. J. Thubrikar,J. Electrochem. Soc. 122 (1975) 1296.
T. H. Nguyen and R. T. Foley,126 (1979) 1855.
R. T. Foley and T. H. Nguyen,129 (1982) 464.
R. M. Stevanovic, A. R. Despic and D. M. Drazic,Electrochim. Acta 33 (1988) 397.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Frers, S.E., Stefenel, M.M., Mayer, C. et al. AC-Impedance measurements on aluminium in chloride containing solutions and below the pitting potential. J Appl Electrochem 20, 996–999 (1990). https://doi.org/10.1007/BF01019578
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF01019578