Abstract
The resistance of differentChlorella vulgaris B. strains obtained as a result of chronic influence with chemical and physical factors have been studied. The aim of our work was to establish the relation between the resistance ofChlorella vulgaris populations with ultrastructural cell organization and the level of endogenic thiols. It was established that destructive processes in the cell are reduced to minimum in the more resistant strains and are of a definite recovering character. The higher resistance is accompanied by higher content of endogenic thiols, enlarging of cell pyrenoid and multilayered cell-covering membrane. From the results obtained it may be supposed that one of the probable mechanisms determining the resistance of theChlorella vulgaris strains obtained by the influence of physical and chemical factors and investigated by us, is connected with the changes which took place in the genetic systems controlling the level of the natural protectors in the cell and is accompanied by structural changes affecting mainly the size and number of cell pyrenoid as well as the thickness of the cell-covering membrane.
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Chankova, S.G., Vinarova, K.M., Nikolov, S.H. et al. Changes inChlorella vulgaris B. populations after chronic influence with chemical and physical mutagenic factors. Biol Plant 32, 35–41 (1990). https://doi.org/10.1007/BF02897340
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DOI: https://doi.org/10.1007/BF02897340