Summary
The yield for polymerization induced by (0.6/1.5) MeV protons has been measured at the surface of a silicon substrate surrounded with a CH4 atmosphere. The results scale the proton energy as the electronic stopping power does; this suggests a dependence of the efficiency of the process on the energy deposition through electronic excitations.
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Work supported in part by Istituto Nazionale di Fisica Nucleare (Gruppo V).
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Calcagno, L., Foti, G. & Strazzulla, G. Carbon build-up by fast protons on silicon substrate in CH atmosphere. Lett. Nuovo Cimento 37, 303–306 (1983). https://doi.org/10.1007/BF02818245
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DOI: https://doi.org/10.1007/BF02818245