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Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method

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Abstract

During last three decades, successive ionic layer adsorption and reaction (SILAR) method, has emerged as one of the solution methods to deposit a variety of compound materials in thin film form. The SILAR method is inexpensive, simple and convenient for large area deposition. A variety of substrates such as insulators, semiconductors, metals and temperature sensitive substrates (like polyester) can be used since the deposition is carried out at or near to room temperature. As a low temperature process, it also avoids oxidation and corrosion of the substrate. The prime requisite for obtaining good quality thin film is the optimization of preparative provisos viz. concentration of the precursors, nature of complexing agent, pH of the precursor solutions and adsorption, reaction and rinsing time durations etc.

In the present review article, we have described in detail, successive ionic layer adsorption and reaction (SILAR) method of metal chalcogenide thin films. An extensive survey of thin film materials prepared during past years is made to demonstrate the versatility of SILAR method. Their preparative parameters and structural, optical, electrical properties etc are described. Theoretical background necessary for the SILAR method is also discussed.

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Abbreviations

Ad:

Adsorption time

CBD:

chemical bath deposition

Cy:

total number of deposition cycles

EN:

ethylenediamine

FTO:

fluorine doped tin oxide

FM:

force modulation microscopy

HH:

hydrazine hydrate

ITO:

indium doped tin oxide

LFM:

lateral force microscopy

PEC:

photoelectrochemical

Re:

reaction time

Ref:

references

Ri:

rinsing time

SILAR:

successive ionic layer adsorption and reaction

subs:

substrate

TA:

tartaric acid

TEA:

triethanolamine

Temp:

deposition temperature

Th:

thickness of the film

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  1. Department of Physics, Shivaji University, 416 004, Kolhapur, India

    H. M. Pathan & C. D. Lokhande

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  1. H. M. Pathan
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Pathan, H.M., Lokhande, C.D. Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method. Bull Mater Sci 27, 85–111 (2004). https://doi.org/10.1007/BF02708491

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