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Plasma source nitrogen ion implantation of Ti-6Al-4V

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  • Symposium on Interfaces and Surfaces of Titanium Materials Dedication to Gerald E. Wasielewski
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Authors and Affiliations

  1. Department of Materials Science and Engineering, University of Wisconsin-Madison, 53706, Madison, WI

    X. Qiu (Graduate Student), R. A. Dodd (Professors) & F. J. Worzala

  2. Department of Nuclear Engineering and Engineering Physics, University of Wisconsin-Madison, 53706, Madison, WI

    J. R. Conrad (Professor)

Authors
  1. X. Qiu
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  2. J. R. Conrad
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  3. R. A. Dodd
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  4. F. J. Worzala
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Additional information

This paper is based on a presentation made in the symposium “Interfaces and Surfaces of Titanium Materials” presented at the 1988 TMS/AIME fall meeting in Chicago, IL, September 25–29, 1988, under the auspices of the TMS Titanium Committee.

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Qiu, X., Conrad, J.R., Dodd, R.A. et al. Plasma source nitrogen ion implantation of Ti-6Al-4V. Metall Trans A 21, 1663–1667 (1990). https://doi.org/10.1007/BF02672581

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