Abstract
Two novel x-ray diffraction techniques with enhanced surface sensitivity, grazing incidence x-ray diffraction (GIXD) and inclined Bragg plane x-ray diffraction (IBXD), have been used to study surface damage in gallium arsenide (GaAs) due to bromine/methanol (Br2/MeOH) chemical mechanical (CM) polishing. A factorial design was implemented to determine the effects of four polishing variables on the surface structure of GaAs. Precise lattice parameter measurements were made in both the surface regions using GIXD and deeper into subsurface regions using IBXD after the various CM polishing treatments. Bromine concentration was found to primarily affect the surface lattice parameter, while the total polish time influenced both the surface and subsurface lattice parameters in GaAs samples that were heavily damaged prior to CM polishing. The combined effect of polishing pad rotation speed and the force exerted on the sample was found to have a much greater effect on the surface lattice parameter than either variable had alone.
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Wang, V.S., Matyi, R.J. X-Ray diffraction observation of surface damage in chemical-mechanical polished gallium arsenide. J. Electron. Mater. 21, 23–31 (1992). https://doi.org/10.1007/BF02670916
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DOI: https://doi.org/10.1007/BF02670916