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New methods of X-ray reflectometry of solids and solid thin films

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Journal of Russian Laser Research Aims and scope

Abstract

X-ray reflectometry makes it possible to determine optical constants of materials in the corresponding range of wavelengths and the thickness of thin films on the basis of measurements of reflection coefficients in relation to the grazing angle. New reflectometry methods based on measurements of either the derivatives with respect to the grazing angle or the ratios of reflection coefficients for two characteristic wavelengths are suggested. Calculations and measurements indicate that the method suggested makes it possible to enhance the sensitivity of reflectometry and the accuracy of measuring the optical constants. Practical implementation of the method is based on an unconventional system of selecting monochromatic beams with the use of semitransparent crystals. The results of reflectometry studies of GaAs single crystals and a Ga0.25Si0.75−Si multilayer structure on a Si substrate are reported.

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Authors and Affiliations

  1. P. N. Lebedev Physical Institute, Russian Academy of Sciences, Leninskii Pr. 53, 117924, Moscow, Russia

    R. M. Feshchenko, I. V. Pirshin, A. G. Touryanski & A. V. Vinogradov

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  1. R. M. Feshchenko
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  2. I. V. Pirshin
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  3. A. G. Touryanski
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  4. A. V. Vinogradov
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Translated from a manuscript submitted December 15, 1998.

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Feshchenko, R.M., Pirshin, I.V., Touryanski, A.G. et al. New methods of X-ray reflectometry of solids and solid thin films. J Russ Laser Res 20, 136–151 (1999). https://doi.org/10.1007/BF02508690

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