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Monte Carlo analysis of electron scattering in microstructure processes in the 0.2 μm region

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Il Nuovo Cimento D

Summary

Theoretical understanding of electron scattering phenomena is essential to the implementation of X-ray lithography. In this paper we theoretically investigate electron scattering effects in X-ray mask-making, by means of a subtractive process, in the 0.2 μm region. The results of Monte Carlo simulation are utilized in order to calculate radial absorbed energy distributions and resist development profiles with respect to some cases of practical interest. Relevant process variables are considered, such as electron-beam energy (10 to 30 keV) and spot sizes. The results show how, by choosing appropriate working conditions, high-resolution patterns can be obtained. Favourable process conditions are found at the low electron energy limit. However, it is shown that suitable electron-beam spot sizes are required in order to take fully advantage of the favourable properties of the scattering.

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References

  1. W. Arden andK. H. Muller:Microelectron. Eng.,6, 53 (1987).

    Article  Google Scholar 

  2. D. F. Kyser andK. Murata:Proceedings of the 6th International Conference on Electron and Ion Beam Science and Technology, edited byR. Bakish (Electrochemical Society, Princeton, N.J., 1974), p. 205.

    Google Scholar 

  3. K. Murata:J. Appl. Phys.,45, 4110 (1974).

    Article  ADS  Google Scholar 

  4. D. C. Joy:Microelectron. Eng.,1, 103 (1974).

    Article  Google Scholar 

  5. I. Adesida, T. E. Everhart andR. Shimizu:J. Vac. Sci. Technol.,16, 1743 (1979).

    Article  ADS  Google Scholar 

  6. G. Messina, A. Paoletti, S. Santangelo andA. Tucciarone: to be published.

  7. M. Parikh andD. F. Kyser:Proceedings of the 8th International Conference on Electron and Ion Beam Science and Technology, edited byR. Bakish (Electrochemical Society, Princeton, N.J., 1978), p. 371.

    Google Scholar 

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Authors and Affiliations

  1. Istituto del Biennio della Facoltà di Ingegneria, Università di Reggio Calabria, Via E. Cuzzocrea 48, 89128, Reggio Calabria

    G. Messina, S. Santangelo & A. Tucciarone

  2. Facoltà di Ingegneria dell'Università di Roma-Tor Vergata, Via Orazio Raimondo, 00173, Roma

    A. Paoletti

Authors
  1. G. Messina
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  2. S. Santangelo
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  3. A. Tucciarone
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  4. A. Paoletti
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Additional information

Research supported by Finalized Project MA.D.E.S.S. of Consiglio Nazionale delle Ricerche.

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Messina, G., Santangelo, S., Tucciarone, A. et al. Monte Carlo analysis of electron scattering in microstructure processes in the 0.2 μm region. Il Nuovo Cimento D 13, 1049–1059 (1991). https://doi.org/10.1007/BF02457167

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  • DOI: https://doi.org/10.1007/BF02457167

PACS 85.40

PACS 85.40.Jq

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