Abstract
Chemical vapour deposition processes (CVD) can produce metastable fine-grained materials as well as epitaxial coatings and can have a very large throwing power depending on the process parameters. Therefore, CVD is an prospective method to deposit high-temperature superconducting materials withT c⩾10 K. One of the first superconductors which were produced was Nb3Sn on tapes and single wires. This superconducting material is, however, today produced by metallurgical methods. Since the detection of Nb3Ge, CVD has become for these coatings the main method of production for the following reasons: high deposition rates, possibility to dope the material by addition of further doping gases to the CVD-process, continuous process. These coatings were deposited on tapes. For the first time the large throwing power of the CVD process was utilized for the deposition of B1 -NbC x N y , on carbon fibre bundles. This opens the possibility to produce multifilamentary structures used for magnetic applications. The structure of the coating can be varied by changing the gas properties, by addition of further gases, by an ultrasonic field, by ignition of a gas discharge and by multi-layering. CVD could also be a prospective method for producing the new class of superconductors withT c⩾30 K.
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Wahl, G., Schmaderer, F. Chemical vapour deposition of superconductors. J Mater Sci 24, 1141–1158 (1989). https://doi.org/10.1007/BF02397041
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DOI: https://doi.org/10.1007/BF02397041