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Lithium intercalation in sputtered MoO3 films

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Abstract

Molybdenum trioxide films have been prepared by RF-sputtering using an oxygen-argon mixture containing sputter gas and a molybdenum target. Samples were deposited at different oxygen flow rates in the range from 1.5 to 8 cm3/min onto ITO-covered thick glass plate or nickel foil substrates. Lithium intercalation of RF-sputtered films has been tested in Li/1M LiClO4-PC-PMMA/MoO3 galvanic cells. We report the electrochemical properties of various lithium-intercalated MoO3 films. Influence of both the growth conditions and the nature of the film substrate have been investigated on the discharge behavior of cells and on the kinetics of intercalation.

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Authors and Affiliations

  1. Laboratoire des Milieux Désordonnés et Hétérogènes, associé au CNRS UA800, Université Pierre et Marie Curie, Case 86, 4 place Jussieu, 75252, Paris cedex 05, France

    B. Yebka & C. Julien

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  1. B. Yebka
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  2. C. Julien
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Yebka, B., Julien, C. Lithium intercalation in sputtered MoO3 films. Ionics 3, 83–88 (1997). https://doi.org/10.1007/BF02375528

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  • DOI: https://doi.org/10.1007/BF02375528

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