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Modeling of a monosilane rf-discharge plasma

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Novosibirsk. Translated from Prikladnaya Mekhanika i Tekhnicheskaya Fizika, No. 1, pp. 13–21, January–February, 1994.

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Shveigert, V.A., Zhilyaev, M.I. & Shveigert, I.V. Modeling of a monosilane rf-discharge plasma. J Appl Mech Tech Phys 35, 13–20 (1994). https://doi.org/10.1007/BF02369744

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