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Silica waveguides on silicon and their application to integrated-optic components

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Abstract

A marriage of optical fibre fabrication technology and LSI microfabrication technology gave birth to fibre-matched silica waveguides on silicon: thick glass layers of high-silica-content glass are deposited on silicon by flame hydrolysis, a method originally developed for fibre preform fabrication. Silica channel waveguides are then formed by photolithographic pattern definition processes followed by reactive ion etching. This ‘high silica (HiS) technology’ offers the possibility of integrating a number of passive functions on a single silicon chip, as well as the possibility of the hybrid integration of both active and passive devices on silicon. This paper reviews the NTT HiS technology and its application to integrated-optic components such as optical beam splitters, optical switches, wavelength-division multi/demultiplexers and optical frequency-division multi/demultiplexers. The clear and simple waveguide structures produced by the HiS technology make it possible to design and fabricate these components with high precision and excellent reproducibility.

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  1. NTT Opto-Electronics Laboratories Tokai, 319-11, Ibaraki, Japan

    Masao Kawachi

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  1. Masao Kawachi
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Kawachi, M. Silica waveguides on silicon and their application to integrated-optic components. Opt Quant Electron 22, 391–416 (1990). https://doi.org/10.1007/BF02113964

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