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Investigation of the behaviour of the impurity atoms in Si by μ SR-method

  • Session 5. Semiconductors and Insulators
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Abstract

The dependence of the residual polarization of negative muons in p-type Si on temperature in the 4.2–270 K range has been investigated. Measurements were carried out in external magnetic field of 0.08 T transverse to the muon spin. The impurity concentration in the sample was 2 · 1013 cm−3. Muon spin relaxation was observed at temperatures below 30 K. The relaxation rate atT=30 K is equal to 0.18±0.08μs−1. The relaxation rate grows with the decrease of temperature and at 4.2 K exceeds 30μs−1. The value of the residual polarization at zero timeP(t=0) is constant within the investigated temperature range.

In the rangeT<30 K data on the relaxation rate are well described by the dependence λ=B·T−q, whereq=2.75. Power dependence of Λ may evidence the essential role of the phonon mechanism in the relaxation of the electron momentum of the acceptor center.

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The authors express their gratitude to V.B. Brudanin and I.A. Yutlandov for providing the sample, and to Yu.B. Gurov for advices.

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Mamedov, T.N., Duginov, V.N., Grebinnik, V.G. et al. Investigation of the behaviour of the impurity atoms in Si by μ SR-method. Hyperfine Interact 86, 717–722 (1994). https://doi.org/10.1007/BF02068969

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  • DOI: https://doi.org/10.1007/BF02068969

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