References
H. MORITA and H. WASHIDA,Jpn J. Appl. Phys. 19 (1980) L228.
A. DENEUVILLE, P. GERARD and R. BILLAR,Thin Solid Films 70 (1980) 203.
M. GREEN, W. C. SMITH and J. A. WEINER,ibid. 38 (1976) 89.
R. HURDICH,Electron. Lett. 11 (1975) 142.
A. DIPAOLA, F. DIQUATRO and C. SUNSERI,J. Electrochem. Soc. 125 (1978) 1344.
T. GODA, T. YOSHINO and N. BABA,Denki Kagaku 51 (1983) 213.
A. CHEMSEDDINE, M. HENRY and J. LIVAGE,Rev. Chim. Mineral. 21 (1984) 487.
T. MATSUSHITA,Bull. Ceram. Soc. Jpn 21 (1986) 236.
S. SAKKA,J. Non-Cryst. Solids 73 (1985) 651.
K. YAMANAKA,J. Appl. Phys. 20 (1981) L307.
A. TSUNASHIMA, H. YOSHIMIZU, K. KODAIRA, S. SHIMADA and T. MATSUSHITA,J. Mater. Sci. 21 (1986) 2731.
I. SHIMIZU, M. SHIZUKUISHI and E. INOUE,J. Appl. Phys. 50 (1979) 4027.
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Unuma, H., Tonooka, K., Suzuki, Y. et al. Preparation of transparent amorphous tungsten trioxide thin films by a dip-coating method. J Mater Sci Lett 5, 1248–1250 (1986). https://doi.org/10.1007/BF01729380
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DOI: https://doi.org/10.1007/BF01729380