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Angular distribution of copper atoms sputtered with energetic ions

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Zeitschrift für Physik

Abstract

Measurements of the angular distribution of copper atoms which are sputtered by noble gas ions within the energy range between 0.1 and 1 MeV have been carried out for different angles of ion incidence. The hemisphere over the target surface could be studied with a microphotometer inside the sputtering chamber and the distributions can be plotted in tri-dimensional diagrams. The results are in principle similar to those obtained at lower energies. The angle of maximum emission varies with ion energy and with the angle of incidence and can be related to the sputtering yield.

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Authors and Affiliations

  1. I. Physikalisches Institut der Justus Liebig-Universität Gießen, Federal Republic of Germany

    K. Rödelsperger, W. Krüger & A. Scharmann

Authors
  1. K. Rödelsperger
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  2. W. Krüger
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  3. A. Scharmann
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Additional information

Dedicated to Prof. Dr. H. Ewald on occasion of his sixtieth birthday.

We thank Mr. G. Trylat for helpful technical assistance, Dr. Hofer, Aarhus, for critical remarks and the Bundesministerium für Forschung und Technologie for support.

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Rödelsperger, K., Krüger, W. & Scharmann, A. Angular distribution of copper atoms sputtered with energetic ions. Z. Physik 269, 83–88 (1974). https://doi.org/10.1007/BF01668873

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  • DOI: https://doi.org/10.1007/BF01668873

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