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The effect of CO adsorption on the resistivity of thin Pd films

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Abstract

Thin Pd films of 5–50nm thickness are deposited on glass substrates under UHV conditions and are subsequently covered step by step with CO at 77 or 293 K. The resistivity increases linearly with the number of adsorbed CO molecules in the initial stages of adsorption while a saturation value develops at higher coverages. The thickness dependence of the linear increase can be quantitatively interpreted with the help of the scattering hypothesis. The scattering cross section is calculated to beA=1.6Å2 in good agreement with the experimental evidence.

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Author notes

  1. B. Heping

    Present address: Yuci University, People's Republic of China

Authors and Affiliations

  1. Institut für Physikalische und Theoretische Chemie, Universität Erlangen, Egerlandstrasse 3, D-91058, Erlangen, Germany

    M. Rauh, B. Heping & P. Wissmann

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  1. M. Rauh
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  2. B. Heping
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  3. P. Wissmann
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Rauh, M., Heping, B. & Wissmann, P. The effect of CO adsorption on the resistivity of thin Pd films. Appl. Phys. A 61, 587–590 (1995). https://doi.org/10.1007/BF01542868

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  • DOI: https://doi.org/10.1007/BF01542868

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