Abstract
Angular distributions of copper atoms sputtered at bombarding energies between 100 and 1000 keV from polycrystalline targets are measured by a collector method. The deposit was detected immediately after bombardment with a photometer placed in the sputtering chamber. This arrangement allowed to perform series of measurements at different ion doses without oxidation of the film. Because of the fastness of this method we obtained a large number of distribution profiles showing principle errors of the collector method effected by condensation coefficients lower than one. The angular distributions are described without influence of these errors by the angle of maximum emission and the base width of the distributions.
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We would like to thank Mr. Trylat for technical assistance and the Bundesministerium für Forschung und Technologie and the Fraunhofer-Gesellschaft for financial support.
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Krüger, W., Rödelsperger, K. & Scharmann, A. Resputtering effects by measurements of angular distributions. Z. Physik 262, 315–326 (1973). https://doi.org/10.1007/BF01400844
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DOI: https://doi.org/10.1007/BF01400844