Die Zerstäubung von Kupfer durch Ne⁺-, Ar⁺-, Kr⁺- und Xe⁺-Ionen im Energiebereich von 75keV bis 1MeV

Abstract

Using a 1,3 MeV Van de Graaff-accelerator the sputtering ratioS of polycristalline copper bombarded by normally incident Ne⁺-, Ar⁺-, Kr⁺-, and Xe⁺-ions was measured in the energy range from 75 keV to 1 MeV. In the case of Kr⁺-ions a broad, plateau-like maximum of the sputtering-curveS=f(E) was found at about 100 keV, for Xe⁺-ions a more pronounced maximum at about 125 keV. The results are discussed applying the theories ofGoldman-Simon, Pease, andMartynenko.