Skip to main content
SpringerLink
Log in

Nanolithography with metastabile helium

  • Rapid Communication
  • Published:
Applied Physics B Aims and scope Submit manuscript

Abstract

We have used a self-assembling monolayer of dodecanethiole molecules as the resist for a lithography technique based on a beam of metastable helium atoms. Doses as low as 3 metastable helium atoms per 10 molecules are enough to write patterns into this resist. An edge resolution of 30 nanometers is demonstrated. The writing mechanism is based on the damage of the resist due to Penning ionization.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

References

  1. J. Perrocheau (ed.): Proceedings of the International Conference on Micro- and Nanofabrication, Elsevier, Amsterdam - Lausanne - New York - Oxford - Shannon - Tokyo, 1996

    Google Scholar 

  2. G. Timp, R.E. Behringer, D.M. Tennant, J.E. Cunningham, M. Prentiss, K.K. Berggren: Phys. Rev. Lett.69 1636 (1992), J.J. McClelland, R.E. Scholten, B.C. Palm, RJ. Celotta: Science262, 877 (1993), R.W. McGowan, D.M. Giltner, S.A. Lee: Opt. Lett.20, 2535 (1995), U. Drodofsky, J. Mlynek et al.: to be published

    Google Scholar 

  3. K.K. Berggren, A. Bard, J.L. Wilbur, J.D. Gillaspy, A.G. Helg, J.J. McClelland, S.L. Rolston, W.D. Phillips, M. Prentiss, G.M. Whitesides: Science269, 1255 (1995)

    Google Scholar 

  4. P.E. Laibinis, G.M. Whitesides, D.L. Allara, Y. Tao, A.N. Parikh, R.G. Ñuzzo: J. Am. Chem. Soc.113, 7152 (1991)

    Google Scholar 

  5. H.U. Müller, C. David, B. Völkel, M. Grunze: J. Vac. Sci. Technol.13, 2846 (1995)

    Google Scholar 

  6. M. Grunze, C. David: private communications

  7. H. Ozaki, Y. Harada: J. Am. Chem. Soc.112, 5735 (1990)

    Google Scholar 

  8. M.P. Seah, W.A. Dench: Surf. Interface Anal.1, 2 (1979)

    Google Scholar 

  9. H. Hotop: Detection of metastable atoms and molecules, Methods of experimental Physics29B, Academic Press, London (1995)

    Google Scholar 

  10. Y. Xia, X. Zhao, E. Kim, G.M. Whitesides: Chem. Mater.7, 2332 (1995)

    Google Scholar 

  11. Ch. Kurtsiefer, J. Mlynek: to appear in Appl. Phys. B

  12. N. Camillone III, C.E.D. Chidsey, G. Liu, G. Scoles: J. Chem. Phys.98, 3503 (1993)

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Fakultät für Physik, Universität Konstanz, 78434, Konstanz, Germany

    S. Nowak, T. Pfau & J. Mlynek

Authors
  1. S. Nowak
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. T. Pfau
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. J. Mlynek
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Nowak, S., Pfau, T. & Mlynek, J. Nanolithography with metastabile helium. Appl. Phys. B 63, 203–205 (1996). https://doi.org/10.1007/BF01095274

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF01095274

PACS

Search

Navigation