Skip to main content
SpringerLink
Log in

Voltammetric study of plating baths for electrodeposition of Co-W amorphous alloys

  • Papers
  • Published:
Journal of Applied Electrochemistry Aims and scope Submit manuscript

Abstract

Cyclic voltammetry and chronoamperometry at glassy carbon and platinum microdisc electrodes have been used to study the electrodeposition of Co−W amorphous alloys. Voltammetric results show that cathodic deposition of Co−W alloy is accompanied by hydrogen evolution and the efficiency of Co−W electrodeposition does not exceed 20%. Voltammetric behaviour of cobalt (II) and tungstate in ammonium citrate solution depend strongly on composition of the plating bath. The concentration of Co(II) ions can be monitoredin situ during electroplating by means of anodic stripping voltammetry at a platinum microelectrode. The deposit of the alloy on the microelectrode is stable in the atmosphere and thus can be stored for subsequent comparison with a deposit obtained later in the life of the working bath.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. F. E. Luborsky, ed., “Amorphous Metallic Alloys’, Butterworths, London (1983).

    Google Scholar 

  2. S. R. Nagel, “Advanced Chemical Physics, I’, (edited by Prigogne and S. A. Rice vol. 5, Wiley, New York (1982), pp. 227–75.

    Google Scholar 

  3. M. D. Archer, C. C. Corke and B. H. Harji,Electrochim. Acta 32 (1987) 13.

    Google Scholar 

  4. P. C. Searson, P. V. Nagaskar and R. M. Latanision, in ‘Modern Aspects of Electrochemistry’, (edited by R. E. White, J. O'M. Bockris, and B. E. Conway), vol. 21, Plenum Press, New York (1990), pp. 121–61.

    Google Scholar 

  5. G. A. Croopnick and D. M. Scruggs',US patent 4 529 668 (1985).

    Google Scholar 

  6. T. Omo, H. Yamamoto and H. L. Glass,J. Electrochem. Soc. 119 (1972) 168.

    Google Scholar 

  7. T. Watanabe,new Materials New Processes 3 (1985) 307.

    Google Scholar 

  8. M. Ogata,Kinzoku Hyomen Gijutsu 39 (1988) 169;CA 109: 13505n.

    Google Scholar 

  9. T. Watanabe,Hyomen Gijutsu 40 (1989) 375;CA 110: 197365s.

    Google Scholar 

  10. A. Budniok and J. Kupka,Electrochim. Acta 34 (1989) 871.

    Google Scholar 

  11. M. Donten and J. Osteryoung,J. Appl. Electrochem. 21 (1991) 496.

    Google Scholar 

  12. J. N. Howarth and D. Pletcher,18 (1989) 644.

    Google Scholar 

  13. E. Chassing, K. Vu Quang and R. Wiart,18 (1989) 839.

    Google Scholar 

  14. A. T. Vas'ko, ‘Encylopedia of Electrochem. of Elements’, (edited by A. J. Bard), vol. 5, Marcel Dekker, New York (1976).

    Google Scholar 

  15. A. T. Vas'ko, ‘Standard Potential in Aqueous Solution’, (edited by A. J. Bard, R. Parsons, and J. Jordon), Marcel Dekker, New York (1985), p. 486.

    Google Scholar 

  16. J. N. Howarth and D. Pletcher,J. Chem. Soc. Faraday Trans. 183 (1987) 2787.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Department of Chemistry, State University of New York at Buffalo, 14214, Buffalo, New York, USA

    K. Wikiel & J. Osteryoung

Authors
  1. K. Wikiel
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. J. Osteryoung
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Wikiel, K., Osteryoung, J. Voltammetric study of plating baths for electrodeposition of Co-W amorphous alloys. J Appl Electrochem 22, 506–511 (1992). https://doi.org/10.1007/BF01024089

Download citation

  • Received:

  • Revised:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF01024089

Keywords

Search

Navigation