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Mössbauer and anodic-oxidation study of Co-implanted Si

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Authors and Affiliations

  1. Instituut voor Kern-en Stralingsfysika, K. U. Leuven, B-3030, Leuven, Belgium

    M. de Potter, G. Langouche, J. De bruyn, M. Van Rossum, R. Coussement & I. Dézsi

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  1. M. de Potter
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  2. G. Langouche
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  3. J. De bruyn
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  4. M. Van Rossum
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  5. R. Coussement
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  6. I. Dézsi
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de Potter, M., Langouche, G., De bruyn, J. et al. Mössbauer and anodic-oxidation study of Co-implanted Si. Hyperfine Interact 10, 769–774 (1981). https://doi.org/10.1007/BF01022008

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