Abstract
Estimates are given for the distribution of the depth of origin of sputtered atoms in the low-fluence limit, as well as the corresponding distribution of atoms sputtered into a given energy interval. The former distribution is well described by an exponential profile, with the characteristic depth being consistent with previous results. The latter distribution is characterized by an energy-dependent depth scale and a shape that varies from exponential at low sputtered-atom energies to inverse-power form at higher energies.
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References
P. Sigmund: Phys. Rev.184, 383 (1969);187, 768 (1969)
M.W. Thompson: Philos. Mag.18, 377 (1968)
P. Sigmund: InSputtering by Ion Bombardment I ed. by R. Behrisch, Topics Appl. Phys.47 (Springer, Berlin, Heidelberg, New York 1981) Chap. 2
P. Sigmund: InInelastic Ion-Surface Collisions, ed. by N.H. Tolk et al. (Academic Press: New York 1977) p. 121
P. Sigmund: Appl. Phys. Lett.14, 114, (1969)
P. Sigmund: Rev. Roum. Phys.17, 823, 969, 1079 (1972)
J. Lindhard, V. Nielsen, M.Scharff: Mat. Fys. Medd. Dan. Vid. Selsk.36, No. 10 (1968)
K.B. Winterbon, P.Sigmund, J.B. Sanders: Mat. Fys. Medd. Dan. Vid. Selsk.37, No. 14 (1970)
M. Abramowitz, I. Stegun:Handbook of Mathematical Functions (Dover, New York 1964)
W.O. Hofer, U. Littmark: Phys. Lett.71A, 457 (1979)
P. Sigmund: J. Appl. Phys.50, 7261 (1979)
U. Littmark, G. Maderlechner: In:Physics of Ionized Gases 1976 (Contributions, J. Stefan Institute, Ljublana (1976) p. 139)