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X-ray topographic study of β-NiAl upon growth of an α-Al2O3 film

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Abstract

The Berg-Barrett X-ray topographic method was employed as a microstructural technique to seek correlations of the metal substructure to the morphological features of α-Al2O3 films grown on β-NiAl. An analysis of diffraction micrographs using {112} and {002} reflections from individual grains in β-NiAl revealed its subgrain structure to a depth of 30 μ. The dimensions of these subgrains were directly related to the density of oxide ridges in the α-Al2O3 films and to the dimensions and shapes of cavities at the NiAl-Al2O3 interface.

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Authors and Affiliations

  1. Institute of Industrial Science, University of Tokyo, 106, Tokyo, Japan

    T. Homma & Y. Pyun

  2. Institute for Materials Research, McMaster University, L8S 4M1, Hamilton, Ontario, Canada

    H. M. Hindam & W. W. Smeltzert

Authors
  1. T. Homma
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  2. H. M. Hindam
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  3. Y. Pyun
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  4. W. W. Smeltzert
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Homma, T., Hindam, H.M., Pyun, Y. et al. X-ray topographic study of β-NiAl upon growth of an α-Al2O3 film. Oxid Met 17, 223–233 (1982). https://doi.org/10.1007/BF00738384

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  • DOI: https://doi.org/10.1007/BF00738384

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