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The critical overpotential for copper dendrite formation

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Abstract

The difference between surface roughness amplification and dendritic growth in copper electrodeposition in the limiting current density range is shown. The critical overpotential of copper dendrite growth is determined as 550 mV.

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Authors and Affiliations

  1. Faculty of Technology and Metallurgy, University of Beograd, Beograd, Yugoslavia

    K. I. Popov, Lj. M. Djukić, M. G. Pavlović & M. D. Maksimović

Authors
  1. K. I. Popov
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  2. Lj. M. Djukić
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  3. M. G. Pavlović
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  4. M. D. Maksimović
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Popov, K.I., Djukić, L.M., Pavlović, M.G. et al. The critical overpotential for copper dendrite formation. J Appl Electrochem 9, 527–531 (1979). https://doi.org/10.1007/BF00617565

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  • DOI: https://doi.org/10.1007/BF00617565

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