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Surface and thin film analysis in silicon technology: actual and future problems and demands

Oberflächen- und Dünnschichtanalyse in der Silizium-Technologie: aktuelle und zukünftige Probleme und Anforderungen

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Summary

In order to aim at production yields at economical levels in VLSI (verylargescaleintegration) technology a high degree of process maturity and stability has to be achieved. This requires a comprehensive characterization and control of the materials and processes used, and henceforth, the availability of appropriate analytical methods and tools. Thereby surface and thin film analytical tools play a key role and have to be applied from the very beginning of the development of a device technology. In the course of the full fabrication process a large number of thin films of inorganic (e.g., metals, insulators) and organic (e.g., photoresists) material is deposited, etched and completely or locally removed. The properties and quality of those thin films and the many surfaces and interfaces formed or occurring prior to and after the various processes such as film deposition, wet and dry etching, cleaning and the like have to be characterized and controlled. For the manifold surface analytical tasks nowadays a large number of techniques is available: Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), Rutherford backscattering (RBS), total reflexion X-ray fluorescence analysis (TRXFA), plasma chromatography mass spectrometry (PCMS). Here examples are discussed where those methods are applied to problems arising in the process development as well as failure analysis of advanced circuits, in particular a 4 M DRAM (megabitdynamicrandomaccessmemory). Finally, limitations of the available methods and future problems and demands are pointed out.

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Authors and Affiliations

  1. Components Division, Semiconductor Technology, Siemens AG, Otto-Hahn-Ring 6, D-8000, München 83, Federal Republic of Germany

    B. O. Kolbesen & W. Pamler

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  1. B. O. Kolbesen
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  2. W. Pamler
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Kolbesen, B.O., Pamler, W. Surface and thin film analysis in silicon technology: actual and future problems and demands. Z. Anal. Chem. 333, 561–568 (1989). https://doi.org/10.1007/BF00572377

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  • DOI: https://doi.org/10.1007/BF00572377

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