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XPS study of the adsorption of ethoxysilanes on iron

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Abstract

The uptake by polished iron surfaces of two R-ethoxysilanes, used commercially as adhesion promoters, has been studied by XPS. It is concluded that the presence of an active group in the organic radical may influence uptake. However, the presence of unsuspected impurities in the solvent used in preparation of the test media also had an important effect. Subsidiary data on the adsorption of butylamine from the gas phase which yield values for the escape depth of electrons in organic materials are also reported.

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Authors and Affiliations

  1. Department of Metallurgy and Materials Technology, University of Surrey, Guildford, Surrey, UK

    R. Bailey & J. E. Castle

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  1. R. Bailey
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  2. J. E. Castle
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Bailey, R., Castle, J.E. XPS study of the adsorption of ethoxysilanes on iron. J Mater Sci 12, 2049–2055 (1977). https://doi.org/10.1007/BF00561978

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  • DOI: https://doi.org/10.1007/BF00561978

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