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Growth of epitaxial silicon layers by ion beam sputtering

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References

  1. A. H. Clark andR. G. Alibozek,J. Appl. Phys. 39 (1968) 2156.

    Google Scholar 

  2. K. E. Haq,J. Electrochem. Soc. 112 (1965) 500.

    Google Scholar 

  3. S. P. Wolsky, T. R. Piwkowski, andG. Wallis,J. Vac. Sci. Tech. 2 (1965) 97.

    Google Scholar 

  4. E. Krikorian andR. J. Sneed,J. Appl. Phys. 37 (1966) 3665.

    Google Scholar 

  5. C. K. Layton andK. B. Cross,Thin Solid Films 1 (1967) 165.

    Google Scholar 

  6. S. Luby,ibid 4 (1969) 81.

    Google Scholar 

  7. B. Molnar, J. J. Flood, andM. H. Francombe,J. Appl. Phys. 35 (1964) 3554.

    Google Scholar 

  8. R. S. Nelson andK. J. Hill,Nucl. Instr. & Methods 38 (1965) 15.

    Google Scholar 

  9. R. V. Stuart andG. K. Wehner,J. Appl. Phys. 33 (1962) 2345.

    Google Scholar 

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Authors and Affiliations

  1. Department of Metallurgy, Imperial College, London S W7

    B. A. Unvala & K. Pearmain

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  1. B. A. Unvala
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  2. K. Pearmain
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Unvala, B.A., Pearmain, K. Growth of epitaxial silicon layers by ion beam sputtering. J Mater Sci 5, 1016–1018 (1970). https://doi.org/10.1007/BF00558187

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  • DOI: https://doi.org/10.1007/BF00558187

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