Abstract
Using direct-current magnetron sputtering deposition, we have successfully prepared highquality epitaxial YBa2Cu3O7−x thin films, on (1 0 0) and (1 1 0) ZrO2, SrTiO3 and LaAlO3 substrates. The films reached zero resistance at about 90 K and had a critical current density, J c (at 77 K, H=O), above 106 Acm−2. Electrical measurements showed that the films had a small microwave surface resistance. The epitaxial structure of the films was studied by X-ray diffraction (XRD), Rutherford backscattering (RBS) and channeling spectroscopy, X-ray double-crystalline diffraction and transmission electron microscopy (TEM). It was found that the c-axis of the film grown on the (1 0 0) substrates under optimum deposition conditions was perpendicular to the substrate surface. But on the (1 1 0) substrates, epitaxial growth was along the (1 1 0) or (1 0 3) direction. The experimental results indicate that the films had excellent superconducting properties and complete epitaxial structure.
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Li, Y., Xiong, G., Gan, Z. et al. Superconducting characteristics and epitaxial-growth analyses of YBa2Cu3O7−x thin films by direct-current magnetron sputtering. JOURNAL OF MATERIALS SCIENCE 28, 4846–4849 (1993). https://doi.org/10.1007/BF00361145
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DOI: https://doi.org/10.1007/BF00361145