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Investigation of the Effect of Barrier Layer Engineering on DC and RF Performance of Gate-Recessed AlGaN/GaN HEMT

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Methodologies and Application Issues of Contemporary Computing Framework

Abstract

E-mode AlGaN/GaN high electron mobility transistors have been investigated over its DC and RF performance. The effect of adding an additional barrier layer of AlxGa1−xN with a different mole fraction of Al in the two layers has been reported. Simulation results indicate an enhancement in the peak transconductance as well as in the ft and fmax values as compared to the single-barrier layer E-mode HEMT, thereby indicating an improvement in the DC and RF characteristics resulting from the barrier layer engineering of the device.

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Correspondence to Angsuman Sarkar .

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Mondal, S., Paul, S., Sarkar, A. (2018). Investigation of the Effect of Barrier Layer Engineering on DC and RF Performance of Gate-Recessed AlGaN/GaN HEMT. In: Mandal, J., Mukhopadhyay, S., Dutta, P., Dasgupta, K. (eds) Methodologies and Application Issues of Contemporary Computing Framework. Springer, Singapore. https://doi.org/10.1007/978-981-13-2345-4_14

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  • DOI: https://doi.org/10.1007/978-981-13-2345-4_14

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