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Raman Spectroscopy of Thin Films on Semiconductors

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Dynamics on Surfaces

Part of the book series: The Jerusalem Symposia on Quantum Chemistry and Biochemistry ((JSQC,volume 17))

Abstract

We demonstrate the ability of state of the art multichannel photon detectors such as the cooled silicon intensified target vidicon and the microchannel plate photomultiplier with a position sensitive resistive anode to detect Raman scattering from weakly scattering, transparent thin films, reacted metallic, layers and disordered surface layers. Vibrational spectra have been obtained for surface layers as thin as 10 A, for frequency shifts as small as 80 cm-1 and for substrates which produce background emission orders of magnitude larger than the Raman emission from the surface layer. Measurements of the Raman spectra of thermally grown SiO2 layers on crystalline Si show that signals from systems with a Raman scattering efficiency below 10-15 can be detected in the presence of the strong second order Raman scattering of Si. Since the Raman efficiency of a monolayer of nitrobenzene is about 10-15, this shows we now have the ability to use Raman scattering to study the behavior of adsorbates and surface layers, independent of the identity of the substrate.

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© 1984 D. Reidel Publishing Company

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Tsang, J.C. (1984). Raman Spectroscopy of Thin Films on Semiconductors. In: Pullman, B., Jortner, J., Nitzan, A., Gerber, B. (eds) Dynamics on Surfaces. The Jerusalem Symposia on Quantum Chemistry and Biochemistry, vol 17. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-5237-9_28

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  • DOI: https://doi.org/10.1007/978-94-009-5237-9_28

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-8815-2

  • Online ISBN: 978-94-009-5237-9

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