Abstract
It is not possible to find the sources of evoked potentials (EPs) or EEG activity unless it is known how many sources exist and what their character (e.g., mono-poles or multipoles) might be. In this paper a method is described that determines the dimensionality of the response space and subsequently uses the spatial information contained by the distribution of the response components over the electrodes to obtain the positions and strengths of the generating sources.
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Reference
Maier J, Dagnelie G, Spekreijse H, Van Dijk B (1987) Principal components analysis for source localization of VEPs in man. Vision Res 27:165–177
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© 1989 Springer-Verlag Berlin Heidelberg
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van Dijk, B.W., Spekreijse, H. (1989). Localization of the Visually Evoked Response: The Pattern Appearance Response. In: Maurer, K. (eds) Topographic Brain Mapping of EEG and Evoked Potentials. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-72658-3_40
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DOI: https://doi.org/10.1007/978-3-642-72658-3_40
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-72660-6
Online ISBN: 978-3-642-72658-3
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