Abstract
Radiation damage is enemy number one for electron microscopical investigations of organic specimens at high resolution. Many different methods have been developed to obtain more information with a resolution better than 1 nm in spite of this handicap. In this paper we restrict ourselves to the application of low specimen-temperatures for fighting beam damage.
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© 1980 Springer-Verlag Berlin Heidelberg
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Dietrich, I., Dubochet, J., Fox, F., Knapek, E., Weyl, R. (1980). Reduction of Radiation Damage by Imaging with a Superconducting Lens System. In: Baumeister, W., Vogell, W. (eds) Electron Microscopy at Molecular Dimensions. Proceedings in Life Sciences. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-67688-8_27
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DOI: https://doi.org/10.1007/978-3-642-67688-8_27
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